Molecular layer deposition of photoactive metal-naphthalene hybrid thin films -

Abstract We here report on photoactive organic-inorganic hybrid thin films prepared by the molecular layer deposition (MLD) method. The new series of hybrid films deposited using 2,6-naphthalenedicarboxylic acid (2,6-NDC) and either hafnium chloride (HfCl4), yttrium tetramethylheptanedionate (Y(thd)3) or titanium chloride (TiCl4) were compared with the known zirconium chloride (ZrCl4) based system. All metal-naphthalene films are […]