Investigation on the antimicrobial activity of chitosan-modified zinc oxide-eugenol cement -

The present study showed that a ZOE-based material has an antibacterial effect and that incorporating CH or COS may increase the antibacterial effect depending on the bacterial species. The total release of eugenol from the materials was stable for up to 18 weeks immersion in water. Eugenol therefore contributed to the antibacterial effect on all the material surfaces investigated. S. mutans exhibited the highest susceptibility to eugenol. The compressive strength of the modified materials was reduced but still met the requirements in ISO 3017.

Effect of methacrylated chitosan incorporated in experimental composite and adhesive on mechanical properties and biofilm formation. -

The results of this study show that methacrylated chitosan (CH-MA) may be incorporated into a composite and into an adhesive to reduce biofilm formation on their surfaces. The mechanical properties of the composite were challenged, but flexural strength measurements still met the requirement set in ISO 4049, whereas no differences were observed for the bonding properties of the adhesives.

Chitosan and chitosan-oligosaccharide as antimicrobial agents in ZOE restorative materials -

This highlights the importance of the antibacterial properties of the material, to kill remaining bacteria during excavation and bacteria that may penetrate the coronal restoration of an endodontically treated tooth.

Chitosan incorporated in denture base resin reduce biofilm formation of Streptococcus mutans and Candida albicans -

The aim of this study was to investigate the biofilm inhibitory effect of methacrylated chitosan covalently incorporated into the PMMA network of denture base resin against Streptococcus mutans and Candida albicans.

Presentation at IADR/Pan European Regional Congress -

Senior engineer Morten Syverud and senior engineer Inger Sofie Dragland from NIOM will contribute with posters presentations at The International Association for Dental Research (IADR). Congress will take place September 20-22, 2016, in Jerusalem, Israel.